Epitaxial ferroelectric thin films on silicon substrates for future electronic devices

Fujitsu Scientific and Technical Journal

Volumn 38, Issue 1, 2002, Pages 46-53

  Kondo, Masao ^a   Maruyama, Kenji ^a   Kurihara, Kazuaki ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; LEAD COMPOUNDS; POLARIZATION; SILICON; SUBSTRATES; TENSILE STRESS;

SILICON SUBSTRATES;

FERROELECTRIC THIN FILMS;

EID: 0036320901     PISSN: 00162523     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

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