157-nm coherent light source as an inspection tool for F2 laser lithography

Optics Letters

Volumn 27, Issue 1, 2002, Pages 46-48

  Suganuma, T ^a   Kubo, H ^a   Wakabayashi, O ^a   Mizoguchi, H ^a   Nakao, K ^a   Nabekawa, Y ^a   Togashi, T ^a   Watanabe, S ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; LITHOGRAPHY; OPTICAL DESIGN; PHOTONS; RESONANCE; SPECTRUM ANALYSIS; ULTRAVIOLET SPECTROMETERS; XENON;

PHOTON RESONANCE; VACUUM ULTRAVIOLET SPECTROMETERS;

LASER APPLICATIONS;

EID: 0036273662     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.27.000046     Document Type: Article

References (15)