Feasibility of highly line-narrowed F2 laser for 157 nm microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (II), Issue , 2000, Pages 1529-1536

  Ershov, Alexander ^a   Duffey, Thomas ^a   Onkels, Eckehard ^a   Partlo, William ^a   Sandstrom, Richard ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ETALONS; GAS LASERS; LASER RESONATORS; OSCILLATORS (ELECTRONIC); POWER AMPLIFIERS;

BEAM ENERGY DENSITY; ETALON BASED RESONATORS; FULL WIDTH AT HALF MAXIMUM (FWHM); LINE NARROWED FLUORINE LASERS; MASTER OSCILLATOR/POWER AMPLIFIER (MOPA) LASERS; SOLID STATE PULSED POWER MODULES (SSPPM);

PHOTOLITHOGRAPHY;

EID: 0033682315     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388992     Document Type: Conference Paper

References (0)