Biocompatible photolithographic process for the patterning of biomolecules

Biosensors and Bioelectronics

Volumn 17, Issue 4, 2002, Pages 269-278

  Douvas, Antonios ^a,b   Argitis, Panagiotis ^a   Misiakos, Konstantinos ^a   Dimotikali, Dimitra ^b   Petrou, Panagiota S ^c   Kakabakos, Sotirios E ^c  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^c INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

Biomolecule; Immunoanalysis; Photoresist

Indexed keywords

SULFONIUM SALT PHOTOACID GENERATORS;

IMAGING TECHNIQUES; PHOTORESISTS; POLYSTYRENES; SENSITIVITY ANALYSIS; SILICON WAFERS; SUBSTRATES;

BIOMATERIALS;

ACRYLIC ACID DERIVATIVE; IMMUNOGLOBULIN G; POLY(TERT BUTYLACRYLATE); POLYSTYRENE; SILICON; SULFONIUM DERIVATIVE; UNCLASSIFIED DRUG;

ANALYTIC METHOD; BIOCOMPATIBILITY; CONFERENCE PAPER; DILUTION; GENERATOR; GEOMETRY; IMAGING; IMMUNOASSAY; MOLECULAR RECOGNITION; OPTICAL RESOLUTION; PATTERN RECOGNITION; PHOTOLITOGRAPHY; SURFACE PROPERTY; THERMAL ANALYSIS;

ANIMALS; COATED MATERIALS, BIOCOMPATIBLE; FEASIBILITY STUDIES; IMMUNOASSAY; IMMUNOGLOBULIN G; MICE; MODELS, CHEMICAL; NANOTECHNOLOGY; PHOTOGRAPHY; POLYSTYRENES; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTIES;

EID: 0036176573     PISSN: 09565663     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0956-5663(01)00294-9     Document Type: Conference Paper

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