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Volumn 15, Issue 11, 1999, Pages 3845-3851

Negative and positive tone protein patterning on e-beam/deep-UV resists

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; HYDROPHOBICITY; POLYACRYLATES; POLYMETHYL METHACRYLATES; RADIATION EFFECTS;

EID: 0032633874     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la980914n     Document Type: Article
Times cited : (56)

References (19)
  • 17
    • 0003349299 scopus 로고
    • Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists
    • Thompson, L., Willson, C. G., Tagawa, S., Eds.; ACS Symposium Series 537; American Chemical Society: Washington, DC, Chapter 11
    • Allen, R. D.; Wallraff, G. M.; Hinsberg, W. D.; Simpson, L. L.; Kunz, R. R. Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists. In Polymers for Microelectronics; Thompson, L., Willson, C. G., Tagawa, S., Eds.; ACS Symposium Series 537; American Chemical Society: Washington, DC, 1994; Chapter 11.
    • (1994) Polymers for Microelectronics
    • Allen, R.D.1    Wallraff, G.M.2    Hinsberg, W.D.3    Simpson, L.L.4    Kunz, R.R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.