Surface structuring and phase formation in thin metallic layers deposited at various temperatures

Surface and Interface Analysis

Volumn 33, Issue 1, 2002, Pages 1-6

  Markwitz, A ^a   Matz, W ^b   Short, K ^c   Waldschmidt, M ^d  

^a GNS SCIENCE   (New Zealand)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^d GOETHE UNIVERSITY   (Germany)

Author keywords

AFM; Diffusion; Metallic compounds; Multilayers; Nanotechnology; SEM; Surface artefacts; Surface structuring; XRD

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; INTERDIFFUSION (SOLIDS); MULTILAYERS; NANOTECHNOLOGY; PHASE COMPOSITION; ROUGHNESS MEASUREMENT; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

PHASE FORMATION; RAMAN ACTIVE SURFACE; SUBSTRATE TEMPERATURE; SURFACE ARTEFACTS; SURFACE STRUCTURING; SURFACE TOPOGRAPHY MEASUREMENT; THIN METALLIC DOUBLE LAYERS;

METALLIC FILMS;

EID: 0036168947     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1151     Document Type: Article

References (13)

1. Ultrasensitive chemical analysis by Raman spectroscopy
2. Quantitative comparision of five SERS substrates: Sensitivity & limit of detection
3. Surface-enhanced Raman scattering
4. Controlled formation of silver islands for surface-enhanced Raman scattering
5. Surface-enhanced Raman spectroscopy using metallic nanostructures