Stencil reticle cleaning using an Ar aerosol cleaning technique

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 71-75

  Okada, Masashi ^a   Kawata, Shintaro ^a   Sonoda, Yuzuru ^b  

^a NIKON CORPORATION   (Japan)

^b SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; ARGON; DECONTAMINATION; DEPOSITION; LOW TEMPERATURE PHENOMENA; PARTICLE SIZE ANALYSIS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; THERMAL EFFECTS;

STENCIL RETICLE CLEANING; THERMAL DISTORTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036124905     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1428270     Document Type: Conference Paper

References (9)