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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 219-225

Spectroscopic characterization of acid generation and concentration and free volume evolution in chemically amplified resists

(4) Jessop, J L P a Goldie, S N b Scranton, A B a Blanchard, G J b

a IA United States (United States)

b MICHIGAN STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DISSOCIATION; DYES; FLUORESCENCE; GROUND STATE; HYDROGEN BONDS; LASER MODE LOCKING; NEODYMIUM LASERS; ORGANIC POLYMERS; PH EFFECTS; POTENTIAL ENERGY; PROTONS; RATE CONSTANTS; SPECTROMETERS; ULTRAVIOLET RADIATION; VISCOSITY;

CRYSTAL VIOLETS; OPTICAL RESPONSES;

PHOTORESISTS;

EID: 0036124840 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1432969 Document Type: Conference Paper

Times cited : (5)

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