New mask blank handling system for the advanced electron beam writer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 905-915

  Yoshitake, Shusuke ^a   Ooki, Kenji ^a   Hirano, Ryoichi ^a   Tojo, Toru ^a   Ogawa, Yoji ^a   Ogura, Katsuhito ^a   Yamamoto, Teruaki ^a   Toriumi, Masaki ^a   Tada, Yoshiaki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY;

MASK BLANK HANDLING SYSTEMS;

MASKS;

EID: 0033314379     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373383     Document Type: Conference Paper

References (3)