Super-resolution enhancement method with phase-shifting mask available for random patterns

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue , 2002, Pages 200-201

  Misaka, Akio ^a   Matsuo, Takahiro ^a   Sasago, Masaru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; LIGHT INTERFERENCE; LSI CIRCUITS; MASKS; PHASE SHIFTERS;

LOGIC PATTERNS; PHASE-SHIFTING MASK (PSM);

PHASE SHIFT;

EID: 0036054245     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)