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Volumn , Issue , 2002, Pages 327-330
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In-situ etching of inp and related materials in MOVPE chamber using PCI3
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ETCHING;
METALLORGANIC VAPOR PHASE EPITAXY;
MORPHOLOGY;
PRESSURE EFFECTS;
SILICA;
SURFACES;
METALLORGANIC VAPOR PHASE EPITAXY (MOVPE) CHAMBERS;
SEMICONDUCTING INDIUM COMPOUNDS;
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EID: 0036045748
PISSN: 10928669
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (5)
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References (9)
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