Chemical beam etching reactions of PCl3 on GaAs(100)

Langmuir

Volumn 15, Issue 8, 1999, Pages 2779-2787

  Singh, Nagindar K ^a   Oerlemans, Stefan ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL REACTIONS; DESORPTION; DISSOCIATION; ETCHING; LOW ENERGY ELECTRON DIFFRACTION; PYROLYSIS; SURFACE PHENOMENA; SURFACE TREATMENT;

CHEMICAL BEAM ETCHING; PHOSPHORUS CHLORIDE; THERMAL DESORPTION SPECTROSCOPY; THERMAL DISSOCIATION;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0345476750     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la981324s     Document Type: Article

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