High resolution negative i-line resist and process for metal lift-off applications

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 846-853

  Toukhy, Medhat ^a   Mullen, Salem ^a   Lu, Pinghung ^a   Neisser, Mark ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DEPOSITION; LITHOGRAPHY; OPTICAL RESOLVING POWER; SEMICONDUCTING GALLIUM ARSENIDE;

METAL DEPOSITION;

PHOTORESISTS;

EID: 0036031574     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474287     Document Type: Article

References (6)

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3. T. Toyoshima, T. Ishibashi, A. Minamide, K. Sugino, K. Katayama, T. Soyoya, I. Arimoto, N. Yasuda, H. Dashi and Y. Matsui, IEDM98, Dig., 333-336 (1998).
4. T. Ishibashi, T. Toyoshima, K. Katayama, M. Tanaka, N. Yasuda, K. Sugino, T. Soyoya, I. Arimoto, Proc. Silicon Technology, No. 11, 12-16 (1999).
5. T. Kanda, H. Tanaka, Y. Kinoshita, N. Watasi, R. Eakin, T. Ishibashi, T. Toyoshima, N. Yasuda and M. Tanaka, Proc. SPIE, 3999, 881-889 (2000).
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