Lithographic process for high-resolution metal lift-off

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1341-1351

  Redd, Randy ^a   Spak, Mark ^a   Sagan, John ^a   Lehar, Octavia ^a   Dammel, Ralph ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIC FILMS; SEMICONDUCTOR DEVICE MANUFACTURE; SOLVENTS;

METAL LIFT OFF PROCESS;

PHOTORESISTS;

EID: 0032632472     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350188     Document Type: Conference Paper

References (5)