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Volumn 4689 II, Issue , 2002, Pages 937-948

The design of a cost effective multi wavelength development rate monitoring tool

Author keywords

Deprotection; Multi wavelength development rate monitor; Standing wave; Surface inhibition

Indexed keywords

ALGORITHMS; COST EFFECTIVENESS; INFORMATION ANALYSIS; LIGHT INTERFERENCE; RESEARCH AND DEVELOPMENT MANAGEMENT; SPECTRUM ANALYSIS; THIN FILMS;

EID: 0036031568     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473422     Document Type: Article
Times cited : (10)

References (10)
  • 4
    • 84994428913 scopus 로고    scopus 로고
    • Ph.D. Dissertation, University of Texas at Austin
    • C.L. Henderson, Ph.D. Dissertation, University of Texas at Austin.
    • Henderson, C.L.1
  • 7
    • 0005023455 scopus 로고    scopus 로고
    • Metrology, inspection, and process control for microlithography XVI
    • Robertson S., Kang D., Scheer S., Brodsky C., Metrology, Inspection, and Process Control for Microlithography XVI, SPIE Vol. 4689, 2002.
    • (2002) SPIE , vol.4689
    • Robertson, S.1    Kang, D.2    Scheer, S.3    Brodsky, C.4
  • 10
    • 84994457878 scopus 로고    scopus 로고
    • Masters Thesis, University of Texas at Austin
    • Scheer S., Masters Thesis, University of Texas at Austin.
    • Scheer, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.