Chemical and processing aspects of thin imaging layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 837-848

  Gehoel van Ansem, Wendy F J ^a   Linskens, Frank ^a   Pham, Vinh Phuc ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; MASKS;

DEEP ULTRAVIOLET (DUV) LITHOGRAPHY; THIN LAYER IMAGING;

PHOTORESISTS;

EID: 0032662521     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350272     Document Type: Conference Paper

References (6)