Is a production level scanning electron microscope linewidth standard possible?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 42-56

  Postek, Michael T ^a   Vladar, Andras E ^a   Villarrubia, John ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION; POLYSILICON; STANDARD REFERENCE MATERIAL;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033703133     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (25)