Profile parameter accuracy determined from scatterometric measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4692, Issue , 2002, Pages 17-28

  Al Assaad, Rayan M ^a   Drège, Emmanuel M ^a   Byrne, Dale M ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA REDUCTION; ELLIPSOMETRY; LIGHT REFLECTION; LIGHT SCATTERING; MASKS; OPTICAL VARIABLES MEASUREMENT; PROCESS CONTROL; QUALITY CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE STRUCTURE;

CRITICAL DIMENSION (CD) MEASUREMENT TECHNIQUES; SCATTEROMETRY;

ULSI CIRCUITS;

EID: 0036031210     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.475665     Document Type: Conference Paper

References (10)

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