Lithographic process monitoring using diffraction measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 147-157

  Drege, Emmanuel M ^a   Byrne, Dale M ^a  

^a UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; LIGHT SCATTERING; LINEARIZATION; OPTICAL VARIABLES MEASUREMENT;

CRITICAL DIMENSIONS (CD); LINEAR INVERSION TECHNIQUES; PERIODIC GRATINGS; RIGOROUS COUPLED-WAVE THEORY (RCWT); SCATTEROMETRY;

PHOTOLITHOGRAPHY;

EID: 0033722612     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)