Lithography: A look at what is ahead

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue , 2000, Pages 1-15

  Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; INTEGRATED CIRCUIT LAYOUT; MASKS; SILICON WAFERS;

OPTICAL PROXIMITY CORRECTION;

PHOTOLITHOGRAPHY;

EID: 0034538621     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405806     Document Type: Conference Paper

References (14)