Contact hole resolution enhancement by Post Exposure Amine Treatment(CONPEAT) process

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 793-798

  Koh, Cha Won ^a   Kim, Jin Soo ^a   Choi, Chang Il ^a   Eom, Tae Seung ^a   Kwon, Won Taik ^a   Jung, Jae Chang ^a   Bok, Cheol Kyu ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Amine treatment; Chemically amplified resist; CONPEAT process; Contact hole shrinkage; Post exposure delay

Indexed keywords

AMINES; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; SHRINKAGE;

CONTACT HOLE SHRINKAGE;

PHOTORESISTS;

EID: 0036029879     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474280     Document Type: Article

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