Influence of salting-out effect in ArF resist development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 562-570

  Yoshida, Yasuhiro ^a   Kumada, Teruhiko ^a   Sasahara, Atsuko ^a   Oshida, Atsushi ^a   Adachi, Hiroshi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Acrylic resist; Development; Dissolution; Ionic strength; Positive type resist; Rinse; Salting out effect

Indexed keywords

CARBOXYLIC ACIDS; GELATION; GELS; HYDROPHILICITY; HYDROPHOBICITY; IONIC STRENGTH; IONIZATION OF LIQUIDS; ORGANIC ACIDS; PHENOLS;

ACRYLIC POLYMERS; ARF RESISTS; CROSS LINKS; DEVELOPMENT; HIGH TRANSPARENCIES; HYDROPHOBIC BONDS; POSITIVE TYPE RESIST; RESIST FILMS; RINSE; SALTING OUT EFFECT;

DISSOLUTION;

EID: 0010226291     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312464     Document Type: Conference Paper

References (1)

1. Y. Yoshida, S. Kubota, K. Ishibashi, S. Ohnishi, N. Kusumoto, "New Concept of Contrast Enhancement of Resist and its Application to Positive Type Resist", J. Electeochem. Soc. (in printing)