Molecular weight tailoring in methacrylate 193 nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1106-1113

  Wallow, T ^a   Brock, P ^a   Truong, H ^a   Allen, R ^a   Opitz, J ^a   Hofer, D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; MOLECULAR WEIGHT; POLYMERS; THERMAL EFFECTS;

GIBBS-DIMARZIO MODEL; METHACRYLATES;

PHOTORESISTS;

EID: 0032652073     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350162     Document Type: Conference Paper

References (15)