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Volumn 3678, Issue I, 1999, Pages 306-315
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Effects of polymer structure on dissolution characteristics in chemically amplified 193 nm resists
a a a a a a
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESION;
COMPUTER SIMULATION;
DISSOLUTION;
DRY ETCHING;
ELECTRIC RESISTANCE;
POLYMERS;
POLYMER BLOCKING LEVEL EFFECTS;
PHOTORESISTS;
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EID: 0032686704
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.350214 Document Type: Conference Paper |
Times cited : (7)
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References (15)
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