Correlations between dissolution data and lithography of various resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 316-328

  DellaGuardia, Ronald ^a   Huang, Wu Song ^a   Chen, Rex ^a   Kang, Doris ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; POLYMER BLENDS;

EXPOSURE LATITUDE; FOCUS LATITUDE;

PHOTORESISTS;

EID: 0032662531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350215     Document Type: Conference Paper

References (9)