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Volumn 70, Issue 4, 2002, Pages 415-423
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Low temperature μc-Si film growth using a CaF2 seed layer
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Author keywords
c Si; CaF2; Low temperature growth; RPCVD; Seed layer
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Indexed keywords
ACTIVATION ENERGY;
CALCIUM COMPOUNDS;
CRYSTALLINE MATERIALS;
GRAIN SIZE AND SHAPE;
LOW TEMPERATURE EFFECTS;
PHOTOCONDUCTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING SILICON;
SUBSTRATES;
THIN FILMS;
VOLUME FRACTION;
X RAY DIFFRACTION ANALYSIS;
CRYSTALLINE FILMS;
FILM GROWTH;
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EID: 0036027463
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(01)00032-0 Document Type: Article |
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Times cited : (8)
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References (11)
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