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Journal of Analytical Atomic Spectrometry

Volumn 17, Issue 4, 2002, Pages 358-365

Direct impurity analysis of semiconductor photoresist samples with laser ablation ICP-MS

(7) Chi, Po Hsiang a Ko, Fu Hsiang b Hsu, Chien Teng a Chen, Hsuen Li b Yang, Chau Kai a Sun, Yuh Chang a Yang, Mo Hsiung a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; COBALT; INDUCTIVELY COUPLED PLASMA; LASER ABLATION; MIXING; PHOTORESISTS; SEMICONDUCTING SILICON; SPIN COATING; TEMPERATURE; THALLIUM;

BAKING; MATRIX-MATCHED ETERNAL CALIBRATION CURVE; SHOCK WAVE MOTION; SILICON SUBSTRATE REFLECTION; SPIKE METALS; SPIKING;

MASS SPECTROMETRY;

EID: 0036010485 PISSN: 02679477 EISSN: None Source Type: Journal
DOI: 10.1039/b110070j Document Type: Article

Times cited : (27)

References (23)

1
- 0003679027
- McGraw-Hill, New York, ch. 7 and 14
- (1988) VLSI Technology
- Sze, S.M.¹

2
- 0004165928
- McGraw-Hill, New York, ch. 9 and 12
- (1996) ULSI Technology
- Chang, C.Y.¹ Sze, S.M.²

3
- 0034268740
- (2000) IEEE Photonics Technol. Lett. , vol.12 , pp. 1126
- Painter, O.¹ Husain, A.² Scherer, A.³ Lee, P.T.⁴ Kim, I.⁵ O'Brien, J.D.⁶ Dapkus, P.D.⁷

4
- 0030649645
- (1997) Int. J. Technol. Manage. , vol.13 , pp. 308
- Liu, S.J.¹ Lee, J.F.²

5
- 0003552056
- Semiconductor Industry Association, San Jose, CA
- (1997) The National Technology Roadmap for Semiconductors , pp. 93

6
- 0004093537
- ACS, Washington, DC, ch. 4
- (1994) Introduction to Microlithography
- Thompson, L.F.¹ Willson, C.G.² Bowden, M.J.³

7
- 0003445248
- Marcel Dekker, New York, ch. 1
- (1998) Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology
- Nonogaki, S.¹ Ueno, T.² Ito, T.³

8
- 0004192386
- Springer, Berlin, ch. 1 and 4
- (1995) Metal Impurities in Silicon-Device Fabrication
- Graff, K.¹

9
- 0003675250
- Wiley, New York, ch. 10
- (1985) Semiconductor Devices Physics and Technology
- Sze, S.M.¹

10
- 21144477747
- (1993) Bunseki Kagaku , vol.42 , pp. T71
- Takenaka, M.¹ Kozuka, S.² Hashimoto, Y.³

11
- 0033485348
- (1999) Anal. Chem. , vol.71 , pp. 5413
- Ko, F.-H.¹ Wang, M.-Y.² Wang, T.-K.³

12
- 0033689845
- (2000) J. Anal. At. Spectrom. , vol.15 , pp. 715
- Ko, F.-H.¹ Lu, J.-K.² Chu, T.-C.³ Chou, C.-T.⁴ Hsiao, L.-T.⁵ Lin, H.-C.⁶

13
- 0030168806
- (1996) J. Electrochem. Soc. , vol.143 , pp. 2025
- Shabani, M.B.¹ Yoshimi, T.² Abe, H.³

14
- 0001248499
- (1994) J. Vac. Sci. Technol. B. , vol.12 , pp. 186
- Dowsett, M.G.¹ Barlow, R.D.² Allen, P.N.³

15
- 0031708919
- (1998) Trends Anal. Chem. , vol.17 , pp. 461
- Russo, R.E.¹ Mao, X.L.² Borisov, O.V.³

16
- 0000062699
- (1999) J. Anal. At. Spectrom. , vol.14 , pp. 1385
- Durrant, S.F.¹

17
- 0030167594
- (1996) J. Anal. At. Spectrom. , vol.11 , pp. 413
- Ko, F.-H.¹ Yang, M.-H.²

18
- 0003415938
- Macmillan, New York, ch. 2
- (1986) Thin Film Optical Filters
- Macleod, H.A.¹

19
- 0001114284
- (1994) Fresenius' J. Anal. Chem. , vol.350 , pp. 242
- Raith, A.¹ Hutton, R.C.²

20
- 0001939824
- (2000) Fresenius' J. Anal. Chem. , vol.368 , pp. 31
- Hemmerlin, M.¹ Somas, D.² Dubuisson, C.³ Loisy, F.⁴ Poussel, E.⁵ Mermet, J.-M.⁶

21
- 0000435997
- (2000) Appl. Phys. Lett. , vol.77 , pp. 2334
- Muramoto, J.¹ Inmaru, T.² Nakata, Y.³ Okada, T.⁴ Maeda, M.⁵

22
- 0034322547
- (2000) Spectrochim. Acta, Part B , vol.55 , pp. 1693
- Borisov, O.V.¹ Mao, X.L.² Russo, R.E.³

23
- 0003428768
- Chapman and Hall, New York, ch. 6
- (1992) Handbook of Inductively Coupled Plasma Mass Spectrometry
- Jarvis, K.E.¹ Gray, A.L.² Houk, R.S.³

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