Fabrication of a 0.2-μm ultra-thin SOI inverted sidewall recessed channel CMOS with single-type polysilicon gate

Journal of the Korean Physical Society

Volumn 40, Issue 1, 2002, Pages 68-71

  Woo, Dong Soo ^a   Park, Boo Sik ^a   Lee, Jong Duk ^a   Park, Byung Gook ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036002392     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (6)

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5. L.K. Wang, J. Seliskar, T. Bucelot, A. Edenfeld and N. Haddad, IEDM Technical Digest, 679 (1991).
6. J. Hui, P. Vande Voorde and J. Moll, IEDM Technical Digest, 392 (1985).