SCOPUS 정보 검색 플랫폼

Volumn 390, Issue 1-2, 2001, Pages 64-69

Characterization of multilayer films of Ti-Al-O-C-N system prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

(3) Kawata, Kazuki a,b Sugimura, Hiroyuki a Takai, Osamu a

a NAGOYA UNIVERSITY (Japan)

b Oriental Engineering Co Ltd (Japan)

Author keywords

Corrosion resistance; Multilayer film; PECVD; Ti Al O C N; Tribology

Indexed keywords

EMISSION SPECTROSCOPY; FILM PREPARATION; GLOW DISCHARGES; MIXTURES; OXIDATION RESISTANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STEEL; SUBSTRATES; TITANIUM COMPOUNDS; TRIBOLOGY;

GLOW DISCHARGE OPTICAL EMISSION SPECTROSCOPY (GDOS);

MULTILAYERS;

EID: 0035973321 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)00939-7 Document Type: Article

Times cited : (51)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.