Measurement of interstitial oxygen concentration in silicon below 1015 atoms/cm3

Applied Physics Letters

Volumn 79, Issue 26, 2001, Pages 4339-4341

  Sassella, A ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035945204     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1429293     Document Type: Article

References (11)

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