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Journal of Chemical Physics

Volumn 114, Issue 24, 2001, Pages 10816-10834

The role of the ground and excited potential energy surfaces in the O(1D and 3P)+SiH4 reactions: A theoretical study

(3) Lam Nguyen, T a Mebel, A M a Lin, S H a

a INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMBUSTION; GAUSSIAN NOISE (ELECTRONIC); POTENTIAL ENERGY; SCATTERING; SURFACE CHEMISTRY;

HEAT OF FORMATION; INFRARED DIODE LASER SPECTROSCOPY;

RATE CONSTANTS;

EID: 0035933458 PISSN: 00219606 EISSN: None Source Type: Journal
DOI: 10.1063/1.1370528 Document Type: Article

Times cited : (15)

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