A Definitive Heat of Vaporization of Silicon through Benchmark ab Initio Calculations on SiF4

Journal of Physical Chemistry A

Volumn 103, Issue 23, 1999, Pages 4427-4431

  Martin, Jan M L ^a   Taylor, Peter R ^b  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346401107     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp9904466     Document Type: Article

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