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Volumn 80, Issue 1-2, 1996, Pages 8-12
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Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films
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Author keywords
Amorphous films; Dual mode PECVD; Hydrogen content; Silicon oxide
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Indexed keywords
ABSORPTION;
AMORPHOUS FILMS;
ANNEALING;
BONDING;
CHEMICAL BONDS;
CHEMICAL VAPOR DEPOSITION;
HYDROGEN;
INFRARED SPECTROSCOPY;
PLASMA APPLICATIONS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICA;
STOICHIOMETRY;
ABSORPTION BAND;
ATOMIC CONCENTRATION;
BENDING MODE;
ELASTIC RECOIL DETECTION ANALYSIS;
HYDROGEN CONTENT;
INTEGRATED ABSORBANCE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
QUANTITATIVE ANALYSIS;
STRETCHING MODES;
THIN FILMS;
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EID: 0030107686
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/0257-8972(95)02677-0 Document Type: Article |
Times cited : (14)
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References (15)
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