Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings

Journal of Physics D: Applied Physics

Volumn 34, Issue 10 SPEC. ISS. A, 2001, Pages

  Mikulik P ^a   Jergel, M ^b   Baumbach, T ^c   Majkova E ^b   Pincik E ^b   Luby, S ^b   Ortega, L ^d   Tucoulou, R ^d   Hudek, P ^e   Kostic I ^e  

^a MASARYK UNIVERSITY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Slovakia)

^c FRAUNHOFER INSTITUTE FOR NON DESTRUCTIVE TESTING   (Germany)

^d LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^e INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL MULTILAYERS; REFLECTION; SEMICONDUCTING SILICON;

MULTILAYER GRATINGS; X-RAY REFLECTIVITY;

DIFFRACTION GRATINGS;

EID: 0035926714     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/10a/339     Document Type: Article

References (9)

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