SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 401, Issue 1-2, 2001, Pages 298-305

In situ resistivity study of copper-cobalt films: Precipitation, dissolution and phase transformation

(4) Zhang, S L a Harper, J M E a Cabral Jr , C a D'Heurle, F M a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

Cobalt; Copper; Sheet resistance

Indexed keywords

ACTIVATION ENERGY; DISSOLUTION; ELECTRIC CONDUCTIVITY; INTERFACIAL ENERGY; PHASE TRANSITIONS; PRECIPITATION (CHEMICAL); RAPID THERMAL ANNEALING; SOLID SOLUTIONS; TANTALUM;

COPPER-COBALT FILMS;

METALLIC FILMS;

EID: 0035904905 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01610-8 Document Type: Article

Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.