Pseudo type-B diffusion regime in Cu grain boundaries below 250 °C

Defect and Diffusion Forum

Volumn 156, Issue , 1998, Pages 43-48

  Gupta, D ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Activation Energy; Grain Boundary Diffusion; Kinetic Regimes; Pseudo Type B Kinetics; Subgrains

Indexed keywords

EID: 0002693060     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.156.43     Document Type: Article

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