Structures of thin ionomer films in solvent mixtures

Langmuir

Volumn 17, Issue 21, 2001, Pages 6675-6682

  Shin, K ^a,c   Rafailovich, M H ^a   Sokolov, J ^a   Gersappe, D ^a   Kim, M W ^b   Satija, S K ^c   Nguyen, D ^d,g   Xu, D ^e   Yang, N L ^e   Eisenberg, A ^f  

^a Stony Brook University   (United States)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d BROOKHAVEN NATIONAL LABORATORY   (United States)

^e CITY UNIVERSITY OF NEW YORK   (United States)

^f MCGILL UNIVERSITY   (Canada)

^g PPG INDUSTRIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; IONOMERS; MIXTURES; NEUTRON REFLECTION; PARAMETER ESTIMATION; SULFONATION; SWELLING; THIN FILMS; WATER;

THIN IONOMER FILMS;

PLASTIC FILMS;

EID: 0035900111     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la001725j     Document Type: Article

References (36)

1. (a) Schlick, S., Ed.; Ionomers-Characterization, Theory, and Applications; CRC Press: New York, 1996.
2. (b) Gebelein, C.G. Biomimetic Polymers; Plenum Press: New York, 1990.
3. (c) Pincus, P. Macromolecules 1991, 24, 2912.
4. (d) Gao, C.; Leporatti, S.; Moya, S.; Donath, E.; Möhwald, H. Langmuir 2001, 17, 3491.
5. (a) Decher, G. Science 1997, 277, 1232.
6. (b) Tripathy, S.K.; Kumar, J.; Lee, S.-H. Langmuir 2000, 16, 10482.
7. (a) Ladam, G.; Schaaf, P.; Cuisinier, F.J.G.; Decher, G.; Voegel, J.-C. Langmuir 2001, 17, 878.
8. Schlenoff, J.B.; Ly, H.; Li, M. J. Am. Chem. Soc. 1998, 120, 7626.
9. (a) Auroy, P.; Auvray, L. Macromolecules 1992, 25, 4134.
10. (b) Auroy, P.; Auvray, L. Langmuir 1994, 10, 225.
11. Satija, S.K.; Gallagher, P.D.; Karim, A.; Fetters, L.J. Physica B 1998, 248, 204.
12. De Gennes, P.-G. Acad. Sci, Ser. II 1996, 322, 819.
13. Lyatskaya, Y.; Balazs, A. Macromolecules 1997, 30, 7588.
14. Zhulina, E.B.; Borisov, O.V.; van Male, J.; Leermakers, F.A. Langmuir 2001, 17, 1277.
15. Ou Ramdane, O.; Auroy, P.; Silberzan, P. Phys. Rev. Lett. 1998, 80, 5141.
16. (a) Tran, Y.; Auroy, P.; Lee, L.-T. Macromolecules 1999, 32, 8952.
17. Tran, Y.; Auroy, P.; Lee, L.-T.; Stamm, M. Phys. Rev. E 1999, 60, 6984.
18. Sukhishvili, S.A.; Granick, S. Langmuir 1997, 13, 4935.
19. (a) Lundberg, R.D.; Makowski, H.S. J. Polym. Sci., Polym. Phys. Ed. 1980, 18, 1821C.
20. (b) Kim, M.W.; Peiffer, D.G.; Ghen, W.; Hsiung, H.; Rasing, Th.; Shen, Y.R. Macromolecales 1989, 22, 2682.
21. Shin, K.; Hu, X.; Zheng, X.; Rafailovich, M.H.; Sokolov, J.; Zaitsev, V.; Schwarz, S.A. Macromolecules 2001, 34, 4993.
22. The strong adsorption was observed only after the annealing procedure.
23. (a) Higgins, J.S.; Benoît, H.C. Polymers and Neutron Scattering; Clarendon Press: London, 1994; pp 124-130.
24. (b) Thirtle, P.N.; Li, Z.X.; Thomas, R.K.; Rennie, A.R.; Satija, S.K.; Sung, L.P. Langmuir 1997, 13, 5451.
25. (a) Russell, T.P. Mater. Sci. Rep. 1990, 5, 171.
26. (b) Fermon, C.; Ott; F.; Menelle, A. X-ray and Neutron Reflectivity: Principles and Application; Daillant, J., Gibaud, Eds.; Springer: Berlin, 1999.
27. (a) Fleer, G.; Cohen Stuart, M.A.; Scheutjens, J.M.H.M.; Cosgrove, T.; Vincent, B. Polymers at Interfaces; Chapman and Hall: London, 1993.
28. (b) Gersappe, D.; Fasolka, M.; Israels, R.; Balazs, A.C. Macromolecules 1995, 28, 4753.
29. SA-SiO = -20. This value is larger than any other favorable parameter in the system.
30. (a) Zhao, X.; Hao, W.; Zheng, X.; Rafailovich, M.H.; Sokolov, J.; Schwarz, S.A.; Pudensi, M.A.A.; Russell, T.P.; Kumar, S.K.; Fetters, L.J. Phys. Rev. Lett. 1992, 69, 776.
31. (b) The multiple rinsing procedures with toluene have been applied to a normal PS thin film; the film was washed out completely while the sulfonated PS thin films remained. Hence, we can conclude that the sulfonated groups act like stickers.
32. (a) Guiselin, O. Europhys. Lett. 1992, 17, 223.
33. (b) Ligoure, C. J. Phys. II 1993, 3, 1607.
34. Increasing the number of layer did not show a significant improvement in the fits. This two-layer model gave a reasonable fit to the entire reflectivity profiles.
35. Perahia D.; Wiesler D.G.; Satija, S.K.; Fetters, J.; Sinha, S.K.; Milner, S.T. Phys. Rev. Lett. 1994, 72, 100.
36. SA-SiO. In this case, there should not be any permanently fixed segment present.