High-temperature electrical properties of NiO-doped WO3 thick films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 9 A/B, 2001, Pages

  Park, J ^a   Hong, K ^a   Lee, W ^a   Shin, Y ^a  

^a Chosun University   (South Korea)

Author keywords

Electrical properties; High temperature; Nickel oxide; Thick film; Tungsten oxide

Indexed keywords

ADDITION REACTIONS; COMPOSITION EFFECTS; DOPING (ADDITIVES); ELECTRIC PROPERTIES; FILM PREPARATION; GRAIN GROWTH; HIGH TEMPERATURE PROPERTIES; NICKEL COMPOUNDS; PRESSURE EFFECTS; SCREEN PRINTING; THERMAL EFFECTS; THICK FILMS;

GAS SENSITIVITY; NICKEL OXIDES; TUNGSTEN OXIDES;

TUNGSTEN COMPOUNDS;

EID: 0035885688     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l967     Document Type: Letter

References (11)