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Volumn 64, Issue 11, 2001, Pages

Diffusion of iridium in silicon: Changeover from a foreign-atom-limited to a native-defect-controlled transport mode

Author keywords

[No Author keywords available]

Indexed keywords

IRIDIUM; SILICON;

EID: 0035884502     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.64.113201     Document Type: Article
Times cited : (6)

References (21)
  • 1
    • 85038334729 scopus 로고    scopus 로고
    • edited by D. L. Beke, Landolt-Börnstein, New Series, III/33A (Springer, Berlin, 1998)
    • Diffusion in Semiconductors, edited by D. L. Beke, Landolt-Börnstein, New Series, Vol. III/33A (Springer, Berlin, 1998).
  • 8
    • 85038302293 scopus 로고    scopus 로고
    • This layer has been taken into account in the diffusion depth coordinate
    • This layer has been taken into account in the diffusion depth coordinate.
  • 9
    • 85038316672 scopus 로고    scopus 로고
    • Our simulations show that diffusion, the wafer cannot account for the large amount of backside Ir
    • Our simulations show that diffusion through the wafer cannot account for the large amount of backside Ir.
  • 13
    • 85038338082 scopus 로고    scopus 로고
    • For fixed (formula presented) (formula presented) settles according to (formula presented) based on mass action law and (formula presented). Conversely, fitting of (formula presented) also determines (formula presented)
    • For fixed (formula presented) (formula presented) settles according to (formula presented) based on mass action law and (formula presented). Conversely, fitting of (formula presented) also determines (formula presented).
  • 14
    • 85038337440 scopus 로고    scopus 로고
    • We checked that the alternative modeling condition (formula presented) with (formula presented) as adjustable flux limitation parameter for (formula presented) leads to essentially the same quantitative results. In this approach (formula presented) increases monotonically with diffusion time, and so does (formula presented)
    • We checked that the alternative modeling condition (formula presented) with (formula presented) as adjustable flux limitation parameter for (formula presented) leads to essentially the same quantitative results. In this approach (formula presented) increases monotonically with diffusion time, and so does (formula presented).
  • 15
    • 85038297847 scopus 로고    scopus 로고
    • (formula presented) has been omitted in Table I since it does not represent a basic physical property
    • (formula presented) has been omitted in Table I since it does not represent a basic physical property.
  • 20
    • 85038311403 scopus 로고    scopus 로고
    • In fact, for (formula presented) the effective diffusivity for both (formula presented) and (formula presented) is given by (formula presented)
    • In fact, for (formula presented) the effective diffusivity for both (formula presented) and (formula presented) is given by (formula presented).
  • 21
    • 85038314722 scopus 로고    scopus 로고
    • The, -controlled diffusivity prevails for (formula presented) and reads (formula presented) producing convex profiles when plotted as (formula presented) vs
    • The I-controlled diffusivity prevails for (formula presented) and reads (formula presented) producing convex profiles when plotted as (formula presented) vs x.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.