Determination of vacancy concentrations in the bulk of silicon wafers by platinum diffusion experiments

Journal of Applied Physics

Volumn 82, Issue 1, 1997, Pages 182-191

  Jacob, M ^a,c   Pichler, P ^a   Ryssel, H ^a,d   Falster, R ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^b MEMC Electronic Materials SpA   (Italy)

^c SIEMENS AG   (Germany)

^d UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001527312     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365796     Document Type: Article

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