Characterization of copper ion sensing thiacalix[4]arene films evaporated on semiconductor substrates

Materials Science and Engineering C: Biomimetic and Supramolecular Systems

Volumn 14, Issue 1, 2001, Pages 17-23

  Ben Ali, M ^a   Jaffrezic Renault, N ^a   Martelet, C ^a   Ben Ouada, H ^c   Davenas, J ^b   Charbonnier, M ^b  

^a ECOLE CENTRALE DE LYON   (France)

^b UNIVERSITÉ LYON 1   (France)

^c Lab LSIS Univeriste Claude B ^*

Author keywords

Chemical microsensor; EIS; ISFET; Surface analysis; Thiacalix 4 arene

Indexed keywords

ATOMIC FORCE MICROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SILICON SENSORS; SUBSTRATES; TRANSISTORS;

THERMAL EVAPORATION;

MATERIALS SCIENCE;

FILM;

EID: 0035880629     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0928-4931(01)00204-1     Document Type: Article

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