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Volumn 91, Issue 3, 2001, Pages 398-402

Hermetic wafer bonding based on rapid thermal processing

Author keywords

Hermetic wafer bonding; MEMS packaging; Rapid thermal processing

Indexed keywords

ALUMINUM; ELECTRONICS PACKAGING; MICROELECTROMECHANICAL DEVICES; RAPID THERMAL ANNEALING; SEMICONDUCTING GLASS; SEMICONDUCTING SILICON; SUBSTRATES; ENCAPSULATION; SILICON WAFERS; SOLDERING ALLOYS;

EID: 0035880220     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00613-6     Document Type: Article
Times cited : (40)

References (11)
  • 7
    • 85001771484 scopus 로고    scopus 로고
    • Heatpulse 210T, STEAG RTP Systems Inc. 4425 Fortran Drive San Jose, CA 95134-2300, USA


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.