Effect of surface structure on photosensitivity in chemically deposited PbS thin films

Thin Solid Films

Volumn 389, Issue 1-2, 2001, Pages 301-306

  Larramendi, E M ^a   Calzadilla, O ^a   Gonzalez Arias A ^a   Hernandez E ^a   Ruiz Garcia, J ^b  

^a UNIVERSITY OF HAVANA   (Cuba)

^b UNIVERSIDAD AUTÓNOMA DE SAN LUIS POTOSÍ   (Mexico)

Author keywords

Chalcogens; Chemical bath deposition; Lead sulfide; PbS

Indexed keywords

DEPOSITION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LEAD COMPOUNDS; MORPHOLOGY; PHOTOSENSITIVITY; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CHEMICAL BATH DEPOSITION;

OPTICAL FILMS;

EID: 0035876821     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00815-X     Document Type: Article

References (17)