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Journal of the Electrochemical Society

Volumn 145, Issue 4, 1998, Pages 1346-1350

Low pressure chemically capor deposited WO3 thin films for integrated gas sensor applications

(2) Davazoglou, D a,b Georgouleas, K a

a INSTITUTE OF MICROELECTRONICS (Greece)

b ELECTROCHEMICAL SOCIETY (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; GOLD; MONOLAYERS; OXIDATION; SILICON; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; TEMPERATURE MEASUREMENT; THIN FILMS; TUNGSTEN COMPOUNDS;

TUNGSTEN OXIDE;

DIELECTRIC FILMS;

EID: 0032050377 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1838463 Document Type: Article

Times cited : (35)

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