Non-Rutherford backscattering studies of SiC/SIMOX structures

Applied Surface Science

Volumn 184, Issue 1-4, 2001, Pages 178-182

  Chen, K W ^a   Yu, Y H ^a   Lei, Y M ^a   Cheng, L L ^a   Sundaraval, B ^b   Luo, E Z ^b   Wong, S P ^b   Wilson, I H ^b   Chen, L Z ^a   Ren, C X ^a   Zou, S C ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

DC magnetic sputtering; Non Rutherford backscattering; SIMOX substrates

Indexed keywords

ATOMIC FORCE MICROSCOPY; BACKSCATTERING; GLOW DISCHARGES; ION IMPLANTATION; MAGNETRON SPUTTERING; MORPHOLOGY; REFLECTION; SEMICONDUCTING FILMS; SUBSTRATES;

ION BEAM ENERGIES;

SILICON CARBIDE;

EID: 0035852196     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00499-8     Document Type: Article

References (9)