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Volumn 78, Issue 11, 2001, Pages 1601-1603

Ballistic electron microscopy study of ultrathin oxidized aluminum barriers for magnetic tunnel junctions

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[No Author keywords available]

Indexed keywords


EID: 0035848183     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1352045     Document Type: Article
Times cited : (27)

References (13)
  • 9
    • 0041569897 scopus 로고    scopus 로고
    • note
    • AJA Intl. 2 in. de magnetron sputter guns were used. The Ar sputtering conditions for depositing the Co and Al layers were 80 W, 2 mTorr and 20 W, 2 mTorr, respectively. The substrate was unheated.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.