Patterning ferromagnetism in Ni80Fe20 films via Ga+ ion irradiation

Applied Physics Letters

Volumn 78, Issue 11, 2001, Pages 1589-1591

  Kaminsky, W M ^a,d   Jones, G A C ^a   Patel, N K ^b,e   Booij, W E ^c   Blamire, M G ^c   Gardiner, S M ^a   Xu, Y B ^a   Bland, J A C ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b TOSHIBA CORPORATION   (Japan)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^e Cambridge Display Technology Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035848142     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1351519     Document Type: Article

References (13)

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12. That is, a picoampmeter monitored beam - sample - stage current. In a multilayer target, when the beam sputters completely through one layer to reveal a new material, there will be a sudden, sharp change in this current. This effect allows one to determine what dose is necessary to destroy each layer.
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