EUV lithography research program at ASET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 238-245

  Okazaki, Shinji ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERICS; IMAGING TECHNIQUES; MASKS; MIRRORS; MULTILAYERS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MULTILAYER MIRRORS; TOP SURFACE IMAGING;

PHOTOLITHOGRAPHY;

EID: 0032686452     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351095     Document Type: Conference Paper

References (0)