SCOPUS 정보 검색 플랫폼

Solid State Communications

Volumn 118, Issue 3, 2001, Pages 135-139

Rinsing and drying studies of porous silicon by high resolution X-ray diffraction

(3) Chamard, V a,b Pichat, C a Dolino, G a

a UNIV GRENOBLE ALPES (France)

b EUROPEAN SYNCHROTRON RADIATION FACILITY (France)

Author keywords

A. Porous silicon; A. Thin films; C. Structural properties; C. X ray scattering; D. Surface chemistry

Indexed keywords

CRYSTAL LATTICES; DEFORMATION; DRYING; HYDROFLUORIC ACID; SEMICONDUCTING FILMS; SILICON WAFERS; SINGLE CRYSTALS; STRAIN; SURFACE CHEMISTRY; THIN FILMS; WATER; WETTING; X RAY CRYSTALLOGRAPHY; X RAY SCATTERING;

LATTICE MISMATCH;

POROUS SILICON;

EID: 0035831989 PISSN: 00381098 EISSN: None Source Type: Journal
DOI: 10.1016/S0038-1098(01)00060-6 Document Type: Article

Times cited : (11)

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