A new three-dimensional 30 GHz bandpass filter using the LIGA micromachined process

Microwave and Optical Technology Letters

Volumn 30, Issue 3, 2001, Pages 199-201

  Park, Kyoung Youl ^a   Lee, Jong Chul ^a   Kim, Jong Heon ^a   Lee, Byungje ^a   Kim, Nam Young ^a   Park, Jae Young ^b   Kim, Geun Ho ^b   Bu, Jong Uk ^b   Chung, Ki Woong ^b  

^a Kwangwoon University   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

Bandpass filters; Micromachined filters; Micromachining

Indexed keywords

BANDWIDTH; ELECTRODEPOSITION; FINITE DIFFERENCE METHOD; MICROMACHINING; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; PERMITTIVITY; X RAY LITHOGRAPHY;

MICROMACHINED FILTERS;

BANDPASS FILTERS;

EID: 0035812198     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/mop.1264     Document Type: Article

References (11)

1. Fabrication of microstructures with high-aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastics moulding (LIGA process)
2. Resist technology for deep-etch synchrotron radiation lithography
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4. Study on fabrication of high aspect ratio MEMS microparts using SR beamline
5. High-aspect micromachining via deep X-ray lithography
6. Micromechanics for actuators via deep X-ray lithography
7. The numerical solution of some important transmission-line problems